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Head: Dietrich R. T. Zahn
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Device Manufacturer Spectralrange Measurement Modi Additional Information
M-2000/T-SolarJ.A. Woollam Co., Inc.,0.7 - 5 eVRCE, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, TransmissionCCD, variable angles, focusing, automatic mapping stage, in situ adapters
VASEJ.A. Woollam Co., Inc.,0.7 - 5 eVRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmissionscanning monochromator, variable angles, adapters for in situ measurements
UVISELHORIBA Jobin Yvon1.5 - 6 eVreflection, in situPEM, PMT, spectroscopic or ultra-fast multi-channel, in situ on a inert gas glove box
RASHome made1.5 - 5.5 eVreflectionPEM, PMT, spectroscopic, in situ and ex situ
MOKEhome built1.5 - 5.5 eVreflection, polar geometryPEM, PMT, spectroscopic
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( )
Head: dong
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Device Manufacturer Spectralrange Measurement Modi Additional Information
wi
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SOITEC ( Bernin)
Head: R&D Scientist Riou (E-Mail: gregory.riou 'at' soitec.fr)
members:↗
Topics: optical properties
Device Manufacturer Spectralrange Measurement Modi Additional Information
GES5E for R&DSopraLab190-1700 nmVariable angle spectroscopic ellipsometry
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L.O.T.-Oriel GmbH & Co KG (Darmstadt)
Head: Dr. Thomas Wagner (E-Mail: wagner 'at' lot-oriel.de)
members:↗
Topics: service measurements, sales
Device Manufacturer Spectralrange Measurement Modi Additional Information
Alpha-SEJ.A. Woollam Co.380 - 900nmRCE, N,C,S, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, TransmissionCCD, 3 angles of incidence
M-2000/T-SolarJ.A. Woollam Co.245 - 1000nmRCE, N,C,S, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, TransmissionCCD, focusing, variable angles, QCM-D
VASEJ.A. Woollam Co.250 - 2400nmRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmissionvariable angles, vertical sample mount, scatterometry, scanning monochromator
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Institute of Semiconductor Physics of NASU ( Kiev)
Head: Dr. Eugene Bortchagovsky (E-Mail: bortch 'at' yahoo.com)
members:↗
Topics: ellipsometry, thin films, surface plasmons, nanoparticles and nanostructures, plasmonics, near-field optics, TERS
Device Manufacturer Spectralrange Measurement Modi Additional Information
wi
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HORIBA Jobin Yvon GmbH (Unterhaching)
Head: Brings
members:↗
Topics: manufacturer, sales, service, application support
Device Manufacturer Spectralrange Measurement Modi Additional Information
SmartSEHORIBA Jobin Yvon440-1000 nmspectroscopic, kinetic, Mueller matrix
UVISEL-ERHORIBA Jobin Yvon190-2100 nmspectroscopic, kinetic
AutoSEHORIBA Jobin Yvon440-1000 nmspectroscopic, Mueller matrix
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Center for Physical Science and Technology ( VILNIUS)
Head: Zigmas Balevicius (E-Mail: zbalevicius 'at' ar.fi.lt)
members:↗
Topics: Spectroscopic ellipsometry, total internal reflection ellipsometry, plasmonics, anisotropy, Mueller matrix
Device Manufacturer Spectralrange Measurement Modi Additional Information
GES5 for R&DSopra250-2000nmrotating polariser, compensator, scanning monochromator, PMT, focusingvariable angle,in situ, TIRE cell for liquids
M2000XJ.A. Woollam210-1000nmRCE, CCD, Mueller matrix, Generalized ellipsometry, focusingVariable angle, in situ, Total internal reflection mode
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Institute of Electron Technology (Warsaw)
Head: MSc. Eng. Witold Rzodkiewicz (E-Mail: rzodki 'at' ite.waw.pl)
members:↗
Topics:
Device Manufacturer Spectralrange Measurement Modi Additional Information
VASEJ.A. Woollam250 nm- 1700 nm
wiSpectroscopic, RAE with AutoRetarder, Jones Matrix, Depolarisation, Reflection, Transmission
wivertical sample mount
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ALD-group of Dr. Matthias Albert (Institute of Semiconductors and Microsystems , Dresden)
Head: Marcel Junige (E-Mail: marcel.junige 'at' mailbox.tu-dresden.de)
members:↗
Topics: in situ, real-time, spectroscopic ellipsometry, atomic layer deposition
Device Manufacturer Spectralrange Measurement Modi Additional Information
M 2000 FIJ. A. Woollam Co., Incfor in-situ-usage from 200 nm to 1700 nmrotating compensator ellipsometer with two charge-coupled device line detectors, mounted under a 65° angle of incidence
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Ellipsometry Workgroup IPF ( Leibniz – Institut für Polymerforschung e. V., Dresden)
Head: Dr. K. J. Eichhorn (E-Mail: kjeich 'at' ipfdd.de)
members:↗
Topics: thin polymer layers: coatings, polymer brushes, hydrogels, polyelectrolyte multilayers, protein adsorption, polymer-nanoparticle systems; in situ studies: ph- and temperature dependent switching in aqueous media, glas transition temperatures in thin polymer films; thin organic layers: optical constants, anisotropy
Device Manufacturer Spectralrange Measurement Modi Additional Information
M-2000UIJ.A. Woollam Co.245-1690 nmRCE, Depolarisation, Reflection, Transmissionvariable angles of incidence, focusing, in-situ pH- and temperature measurement, SPR
Alpha-SEJ.A. Woollam Co.380 - 900 nmRCE, Depolarisation, Reflection, Transmission3 angles of incidence, in-situ pH- and temperature measurement
EP3Accurion GmbH633 nmPCSA, Auto-nulling Imaging Ellipsometervariable angles of incidence, in-situ, temperature measurement
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Ellipsometry Workgroup Leipzig (Uni Leipzig / IOM Leipzig, Leipzig)
Head: Dr. Rüdiger Schmidt-Grund (E-Mail: Schmidt-Grund 'at' physik.uni-leipzig.de)
members:↗
Topics: dielectric function, electronic bandstructure, wide gap oxides, microresonators, excitons, exciton-polaritons, magneto-optical coupling, electro-optical coupling, correlated systems, structured surfaces, plasmonic structures, nanostructure arrays, semiconductors, preowskites, ferroelectrics, multiferroics, ZnO, MgZnO, BaTiO3, StTiO3
Device Manufacturer Spectralrange Measurement Modi Additional Information
M2000J.A. Woollam Co., Inc.0.75 - 3.38 eVRCE, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, TransmissionCCD, in-situ, focussing (spot size 200mum), multi-angle option (13° - 90°), 588 wavelength, time resolution 0.1 - 10s, rotating compensator
VASEJ.A. Woollam Co., Inc.0.75 - 5 eVRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmission Scatterometryfocussing (Spot size 200mum), UHV kryostat (10 - 470 K, 5*10^-11 mbar), rotating sample stage, variable angle, vertical sample mount, scanning monochromator
IRSEJ.A. Woollam Co., Inc.300 - 5000 rcmRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, TransmissionFTIR based, variable angle, vertical sample mount
VUV-VASEJ.A. Woollam Co., Inc.0.5 - 9 eVRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmission Scatterometry300mm R-Theta scanning sample stage, variable angle, vertical sample mount, scanning monochromator, cryostat (4.2 - 500 K), atmospheric cell
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Ellipsometry, Transparent Conductive Oxides (Division of Ion Technology, Institute of Ion-Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresen)
Head: Dr. Mykola Vinnichenko (E-Mail: m.vinnichenko 'at' hzdr.de 'at' )
members:↗
Topics: in situ spectroscopic ellipsometry, interfaces between transparent conductive oxides (TCO) and photovoltaic active layers, TCO properties evolution during growth or post-deposition treatment, growth mechanisms of oxide thin films, characterization of high-refractive index materials
Device Manufacturer Spectralrange Measurement Modi Additional Information
M-2000VJ. A. Woollam Inc., USA1.24 - 3.3 eVRotating Compensator Ellipsometer (RCE), in situ ellipsometry, Jones Matrix, anisotropy, depolarization, Mueller MatrixCCD, QTH lamp, time resolution 0.1-10 s, fixed angle of light incidence, installation: ex situ stage, magnetron sputter deposition chambers or annealing chamber
M-2000FIJ. A. Woollam Inc., USA0.75-5.9 eVRotating Compensator Ellipsometer (RCE), in situ ellipsometry, Jones Matrix, anisotropy, depolarization, Mueller MatrixCCD, Xe-lamp, time resolution 0.1-10 s, fixed angle of light incidence, installation: ex situ stage, magnetron sputter deposition chambers or annealing chamber
VASEJ. A. Woollam Inc., USA0.75-5.0 eVRotating Analyzer Ellipsometer (RAE) with AutoRetarder, Jones Matrix, depolarization, anisotropyvariable angle of light incidence, measurements in transmission or reflection mode
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IR group ISAS (Leibniz – Institut für Analytische Wissenschaften - ISAS - e.V., Berlin and Dortmund)
Head: Dr. Karsten Hinrichs (E-Mail: hinrichs 'at' physik.tu-berlin.de)
members:↗
Topics: Infrared Ellipsometry, method developement for in-situ vibrational spectroscopy, synchrotron ellipsometry, solid-liquid interfaces, functional polymer films, organic films for solar cells and biosensors, metamaterials, self-assembling monolayers, porphyrins
Device Manufacturer Spectralrange Measurement Modi Additional Information
ISAS – MIR - Labellipsometer-400-4000 wavenumbersMultiple angle, Röseler principle, Transmission, Reflection, ATRIR - Ellipsometer externally attached at Bruker Vertex 70 or IFS 55
IR synchrotron mapping Ellipsometer-800 - 3000 wavenumbersMultiple angle, Rotating Compensator, variation of focus diameter between 0.2 to 1 mm. Externally attached to Bruker IFs 66v, using synchrotron light source (BESSY II of the HZB-Berlin), equipped with mapping table (Sentech Instruments). Limited access via BESSY beam time proposals and prior approval by the station manager (Karsten Hinrichs, Ulrich Schade). Developed by Arnulf Röseler, Karsten Hinrichs and Michael Gensch.
ISAS – NIR - Labellipsometer-800-10000 wavenumbersMultiple angle, Röseler principle, Transmission, ReflectionIR - Ellipsometer externally attached at Bruker Tensor
Combined IRSE - RASISAS, Laytec GmbH BerlinUV- MIRCombined Laytec RAS, IR ellipsometry for electrochemical studies at solid-liquid interfaces. Common set-up of ISAS, Laytec GmbH Berlin and HZB Berlin.
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Laboratory of Multifunctional Materials and Structures ( National Institute of Materials Physics, Magurele)
Head: dr. Aurelian-Catalin Galca (E-Mail: ac_galca 'at' infim.ro)
members:↗
Topics: spectroscopic ellipsometry; xrd; luminescence spectroscopy; transparent conductive and flexible thin films; transparent conductive oxides, semiconducting chalcogenides; ferrofluids; solar cells, thin films, nanowires, quantum dots, semiconductor devices, chalcogenides, light emitting diodes, mocvd
Device Manufacturer Spectralrange Measurement Modi Additional Information
V-VASEWoollam193 up to 2200nm, 6.4 down to 0.56eVex-situ, sample translation, liquid-cell, Instec heat stage -160C up to 600C
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LaNN - Laboratory for Nanofabrication of Nanodevices (VenetoNanotech, Padova)
Head: Ph.D. Gianluca Ruffato (E-Mail: gianluca.ruffato 'at' venetonanotech.it)
members:↗
Topics: plasmonics, metallic gratings, metamaterials, nanoporous gold
Device Manufacturer Spectralrange Measurement Modi Additional Information
VASE EllipsometerJ.A. Woollam Co.250-2400 nmRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmission variable angles and wavelengths, vertical sample mount, XY translator, scatterometry, microfluidic system
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LPMD ( University Paul Verlaine-Metz, Metz)
Head: Dr En Naciri (E-Mail: ennacir 'at' univ-metz.fr)
members:↗
Topics: ellipsometry ; Nanocrystals ; Dielectric function ; Anisotropy
Device Manufacturer Spectralrange Measurement Modi Additional Information
Rotating Polarizer ellipsometer and Rotating Compensator ellipsometer made in LPMD laboratory 250 to 900 nmwi
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Polarimetry Instrumentation and Raman Spectroscopy Group (Ecole Polytechnique, Palaiseau)
Head: PhD Enric Garcia-Caurel (E-Mail: enric.garcia-caurel 'at' polytechnique.edu)
members:↗
Topics: ultraviolet, visible, infrared, ellipsometry, polarimetry, Mueller, thin-film, plasmons, semiconductor, solar
Device Manufacturer Spectralrange Measurement Modi Additional Information
NIR - MIR Mueller Polarimeter / Ellipsometer Homemade Prototype - LPICM2,500 - 14,000 nm - 0.6 - 0.09 eVRelection mode, Angle of Incidence 50,60,70 and 80°Uses 1)Characterization of metals and doped semiconductors. Optical/Electrical properties. 2) Characterization of organic thin films 3) Characterization of bio-films
MM16 - Spectroscopic Mueller Polarimeter/EllipsometerHORIBA450 - 850 nm / 1.4 6 - 2.75 eVReflexion and Transmission, Multiple angle of incidenceUses: 1) Optical metrology - Profile reconstruction of 1D and 2D diffraction gratings. 2) Anisotropy measurements - Determination of the birefringence of thin films and bulk materials 3) Multiple angle of incidence ellipsometry.
UVISEL - Spectroscopic EllipsometerHoriba275-1750 nm / 4.5-07 eVReflection Ellipsometry, angle of incidence = 70°Routine Thin Film Characterization. Metals (Au, Ag, Al, Cr) Semiconductors(a-Si, c-Si, c-Ge, ZnO:Al) Dielectrics (SiO2, SiN, SiON)
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Prof. Dressel ( 1.Physikalisches Institut, Uni-Stuttgart, Stuttgart)
Head: Dr. Bruno Gompf (E-Mail: gompf 'at' pi1.physik.uni-stuttgart.de)
members:↗
Topics: Ultrathin metal films, metamaterials, organic semiconductors, correlated electron systems
Device Manufacturer Spectralrange Measurement Modi Additional Information
VASEJ.A. Woollam Co.230 - 2300 nmRAE with AutoRetarder, Mueller Matrix, Jones Matrix, Depolarisation, Reflection, Transmissionvariable angles of incidence, variable azimuth orientation, variable temperature 5 - 350K, Mikrospot (200µm)
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Solar Thermal Materials ( Institute for Solar Energy Research Hamelin GmbH, Hamelin, Germany)
Head: Dr. Reineke-Koch (E-Mail: r.reineke-koch 'at' isfh.de)
members:↗
Topics: solar thermal collectors, selective absorber layers, low-e coating, transparent conductive oxides, accelerated ageing tests, thin film photovoltaics
Device Manufacturer Spectralrange Measurement Modi Additional Information
Spectral Ellipsometer M-2000 UIJ.A. Woollam Inc., USA240 - 1700 nmVariable angle spectal ellipsometry, RCE, compensator, depolarisation, transmittanceheating and cooling equipment (system W1-25 from INSTEC) for a temperature range from -80°C to 600°C
Spectral Ellipsometer IR-VASEJ.A. Woollam Inc., USA1700 - 33000 nmVariable angle spectral ellipsometry, RCE, compensator, depolarisation, transmittanceheating and cooling equipment (system W1-25 from INSTEC) for a temperature range from -80°C to 600°C
UV-VIS-NIR Spectrometer Cary 5000Agilent (Varian)180 - 3000 nmtransmittance and reflectance, specular and diffusreflectance measurements with traceable standards (specular and diffus). Simultaneous modelling of absolute data and ellipsometric data. Wavelength range for diffuse measurements 250 - 2500 nm.
FT-IR Spectrometer Equinox 55Bruker2500 - 50000 nmtransmittance and reflectance, specular and diffusreflectance measurements with traceable standards (specular and diffus). Simultaneous modelling of absolute data and ellipsometric data. Wavelength range for diffuse measurements 2500 - 16700 nm
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